SUBSTRATE LIQUID PROCESSING DEVICE
PROBLEM TO BE SOLVED: To provide a substrate liquid processing device which can maintain a nozzle arm in a clean state with the suppression of contamination in the device.SOLUTION: In a substrate liquid processing device 16, a processing liquid nozzle 41 held by nozzle arms 42, 43 supplies a process...
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| Format | Patent |
| Language | English Japanese |
| Published |
16.05.2016
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| Abstract | PROBLEM TO BE SOLVED: To provide a substrate liquid processing device which can maintain a nozzle arm in a clean state with the suppression of contamination in the device.SOLUTION: In a substrate liquid processing device 16, a processing liquid nozzle 41 held by nozzle arms 42, 43 supplies a processing liquid to a substrate W held by a substrate holding unit 31. A drive mechanism 44 moves the processing liquid nozzle 41 between a position in which the processing liquid is supplied to the substrate W and a retraction position. An arm washing tank 23 dips the nozzle arms 42, 43 into a clearing solvent to clean the whole area of the arm members.SELECTED DRAWING: Figure 4
【課題】装置内の汚染を抑えつつノズルアームを清浄な状態に維持することが可能な基板液処理装置を提供する。【解決手段】基板液処理装置１６において、ノズルアーム４２、４３に保持された処理液ノズル４１は基板保持部３１に保持された基板Ｗに処理液を供給し、駆動機構４４は基板Ｗに処理液を供給する処理位置と、退避位置との間で、処理液ノズル４１を移動させ、アーム洗浄槽２３は、ノズルアーム４２、４３を洗浄液中に浸漬させてこれらの部材の全面の洗浄を行う。【選択図】図４ |
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| AbstractList | PROBLEM TO BE SOLVED: To provide a substrate liquid processing device which can maintain a nozzle arm in a clean state with the suppression of contamination in the device.SOLUTION: In a substrate liquid processing device 16, a processing liquid nozzle 41 held by nozzle arms 42, 43 supplies a processing liquid to a substrate W held by a substrate holding unit 31. A drive mechanism 44 moves the processing liquid nozzle 41 between a position in which the processing liquid is supplied to the substrate W and a retraction position. An arm washing tank 23 dips the nozzle arms 42, 43 into a clearing solvent to clean the whole area of the arm members.SELECTED DRAWING: Figure 4
【課題】装置内の汚染を抑えつつノズルアームを清浄な状態に維持することが可能な基板液処理装置を提供する。【解決手段】基板液処理装置１６において、ノズルアーム４２、４３に保持された処理液ノズル４１は基板保持部３１に保持された基板Ｗに処理液を供給し、駆動機構４４は基板Ｗに処理液を供給する処理位置と、退避位置との間で、処理液ノズル４１を移動させ、アーム洗浄槽２３は、ノズルアーム４２、４３を洗浄液中に浸漬させてこれらの部材の全面の洗浄を行う。【選択図】図４ |
| Author | INOUE SHIGEHISA TOJIMA JIRO AKUMOTO MASAMI |
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| DocumentTitleAlternate | 基板液処理装置 |
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| RelatedCompanies | TOKYO ELECTRON LTD |
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| Snippet | PROBLEM TO BE SOLVED: To provide a substrate liquid processing device which can maintain a nozzle arm in a clean state with the suppression of contamination in... |
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| SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| Title | SUBSTRATE LIQUID PROCESSING DEVICE |
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