DRAWING APPARATUS AND DRAWING METHOD FOR DRAWING APPARATUS

• Main Author: MIFUJI KIMIYASU
• Format: Patent
• Language: English; Japanese
• Published: 20.08.2015
• Subjects: HAIRDRESSING OR SHAVING EQUIPMENT; HAND OR TRAVELLING ARTICLES; HUMAN NECESSITIES; MANICURING OR OTHER COSMETIC TREATMENT

PROBLEM TO BE SOLVED: To provide a drawing apparatus and drawing method for the drawing apparatus capable of curing a liquid material of a photocurable type by performing photoirradiation in the apparatus, in performing printing on a nail by using the liquid material of the photocurable type.SOLUTION: A drawing apparatus 1 whose drawing target surface is a surface of a nail T of a finger includes: a pen 71 for performing drawing on the surface of the nail T by using a liquid material of a photocurable type to be cured under light; a photoirradiation mechanism 91 for irradiating, after the drawing, the liquid material of the photocurable type applied on the nail T with light including a specific wavelength region capable of curing the liquid material of the photocurable type to cure the liquid material of the photocurable type; and a light blocking wall 65 that is arranged between the pen 71 and the photoirradiation mechanism 91 and blocks arrival of the light at the pen 71, while the photoirradiation mechanism 91 irradiates the nail T. 【課題】光硬化型の液体材料を用いて爪に印刷を施す場合において、装置内において光照射を行い、光硬化型の液体材料を硬化させることのできる描画装置及び描画装置の描画方法を提供する。【解決手段】指の爪Ｔの表面を描画対象面とする描画装置１において、ペン７１により光によって硬化する光硬化型の液状材料を用いて爪Ｔの表面に描画を施し、その後爪Ｔに塗布された光硬化型の液状材料に光照射機構９１により光硬化型の液状材料を硬化させることができる特定の波長領域を含む光を照射して硬化させるものであり、光照射機構９１によって爪Ｔに対して光照射を行っている間、ペン７１と光照射機構９１との間にペン７１への光の到達を遮る遮光壁６５が配置されるようにした。【選択図】図１