LIQUID PROCESSING APPARATUS

• Main Authors: TOJIMA JIRO, INOUE SHIGEHISA, MICHIKI YUICHI, AKUMOTO MASAMI
• Format: Patent
• Language: English; Japanese
• Published: 07.05.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a liquid processing apparatus which is able to discharge a process liquid to cups while inhibiting the occurrence of mist.SOLUTION: A liquid processing apparatus supplies a process liquid from a processing liquid supply part 40 to a rotating substrate W to perform liquid processing. In the liquid processing apparatus, a substrate holding part 31 which is formed so as to rotate around a vertical axis includes a holding surface 311 for suctioning and holding the substrate W in a horizontal manner. A guide part 34 is integrally formed with the substrate holding part 31, disposed around the substrate W held by the substrate holding part 31, and has a guide surface 347 which is provided at a level equal to or lower than a level of an upper surface of a peripheral part of the substrate W and used for guiding the process liquid flowing on the upper surface of the substrate W. A rotation cup 35 integrally rotates with the substrate holding part 31 and guides the process liquid toward cups 50a to 50c provided at the outer side of the substrate holding part 31 between itself and the guide part 34. 【課題】ミストの発生を抑制しつつ処理液をカップへ向けて排出することが可能な液処理装置を提供する。【解決手段】処理液供給部４０から、回転する基板Ｗに処理液を供給して液処理を行う液処理装置において、鉛直軸周りに回転自在に構成された基板保持部３１は、基板Ｗを水平に吸着保持するための保持面３１１を備える。ガイド部３４は、基板保持部３１と一体に形成されると共に、当該基板保持部３１に保持された基板Ｗの周囲に配置され、基板Ｗの周縁部の上面の高さと同じか、この高さよりも低い高さ位置に設けられ、基板Ｗの上面を流れてきた処理液を案内するための案内面３４７を備える。回転カップ３５は、基板保持部３１と共に一体的に回転し、基板保持部３１の外方に設けられたカップ５０ａ〜５０ｃへ向けて、ガイド部３４との間で処理液を案内する。【選択図】図３