METHOD FOR RECOVERING CERIUM ABRASIVES

• Main Authors: NAGAI YUKI, MAEZAWA AKIHIRO, INUI CHIE, HIRAYAMA NATSUMI
• Format: Patent
• Language: English; Japanese
• Published: 19.02.2015
• Subjects: DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a method for recovering cerium abrasives, which can obtain high-purity recycled polishing material, from polishing material slurry containing used cerium abrasives.SOLUTION: A method for recovering cerium abrasives comprises a slurry recovery step of recovering polis...