INFORMATION PROCESS DEVICE AND INFORMATION PROCESS METHOD

• Main Author: NAKAZATO YUSUKE
• Format: Patent
• Language: English; Japanese
• Published: 27.10.2014
• Subjects: CALCULATING; COMPUTING; COUNTING; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; PHYSICS; TESTING

PROBLEM TO BE SOLVED: To efficiently hold depth information acquired by a triangulation method on the basis of reflection light of projected structured light.SOLUTION: An information process device acquires a two-dimensional image obtained by receiving reflection light of structured light projected to an object from a projection device 10 by an imaging device 20, and acquires depth information in a three-dimensional space from the two-dimensional image by a triangulation method. As the structured light to be projected, the structured light is light that constitutes a plurality of discrete measurement lines almost orthogonal to a straight line connecting the projection device 10 and the imaging device 20. The depth information has been conventionally obtained like a distance image 50, but according to the present invention, the depth information is stored in each element of a measurement line map 60 serving as a two-dimensional array composed of axes 90 corresponding to the number of measurement lines and an axis 70 corresponding to a width of a photographing image. Accordingly, a holding capacity of the depth information is reduced, and further, a characteristic point is mapped by the measurement line map and thereby a collation process of a target object is speeded up. 【課題】投影された構造化光の反射光に基づく三角測量法で取得された奥行き情報を、効率良く保持する。【解決手段】物体に対して投影装置10から投影された構造化光の反射光を撮像装置20で受光して得られる2次元画像を取得し、該2次元画像から、三角測量法により3次元空間における奥行き情報を取得する。なお、投影される構造化光としては、投影装置10と撮像装置20とを結ぶ直線に対して略直交する複数の離散的な計測線を構成する光である。奥行き情報は、従来であれば距離画像50のように得られていたが、本発明では、計測線の本数に応じた軸90と、撮影画像の幅に応じた軸70からなる2次元配列である計測線マップ60の各要素に格納する。これにより、奥行き情報の保持容量が削減される。また、計測線マップによる特徴点の対応付けを行うことで、対象物体の照合処理が高速化される。【選択図】 図1