ELECTRON BEAM EXPOSURE DEVICE, AND ELECTRON BEAM EXPOSURE METHOD

PROBLEM TO BE SOLVED: To provide an electron beam exposure device and an electron beam exposure method in which the exposure throughput can be improved while suppressing the blur of electron beams.SOLUTION: After an electron beam EBdischarged from an electron gun 101 is cut by a first aperture 103a...

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Bibliographic Details
Main Author YAMADA AKIO
Format Patent
LanguageEnglish
Published 22.05.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide an electron beam exposure device and an electron beam exposure method in which the exposure throughput can be improved while suppressing the blur of electron beams.SOLUTION: After an electron beam EBdischarged from an electron gun 101 is cut by a first aperture 103a to form a rectangle-shaped electron beam EB, an electron beam EBis obtained by cutting the electron beam EBby second apertures 140a and 150b in such a way that edges formed by the first aperture 103a is cut off from the electron beam EB. As a result, the blur caused by the influence of Coulomb interaction of the electron beam EBcan be prevented between the first aperture 103a and the second aperture 104a, and accurate exposure can be performed while increasing current density of the electron beam EB.
Bibliography:Application Number: JP20120247696