COMPOSITIONS AND ANTIREFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY

• Main Authors: WEAVER JOHN D, SRIVASTAVA YASMIN N, RAO YUANQIAO, AUGER ROBERT L, SULLIVAN CHRISTOPHER P, KIARIE CECILIA W, FENTON JR JEFFREY L, JENKINS ROXANNE M, POPA PAUL J, EVANS JESSICA P
• Format: Patent
• Language: English
• Published: 18.04.2013
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a composition and an antireflective coating for photolithography.SOLUTION: A first composition includes at least: a compound F1 selected from the following (A) formula 1, wherein Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one mu...