COMPOSITIONS AND ANTIREFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY
PROBLEM TO BE SOLVED: To provide a composition and an antireflective coating for photolithography.SOLUTION: A first composition includes at least: a compound F1 selected from the following (A) formula 1, wherein Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one mu...
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Format | Patent |
Language | English |
Published |
18.04.2013
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Abstract | PROBLEM TO BE SOLVED: To provide a composition and an antireflective coating for photolithography.SOLUTION: A first composition includes at least: a compound F1 selected from the following (A) formula 1, wherein Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one multiple bond, these multiple bonds are not in a conjugated configuration; and R1, R2, R3 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and other three specific silicon-containing compounds. |
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AbstractList | PROBLEM TO BE SOLVED: To provide a composition and an antireflective coating for photolithography.SOLUTION: A first composition includes at least: a compound F1 selected from the following (A) formula 1, wherein Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one multiple bond, these multiple bonds are not in a conjugated configuration; and R1, R2, R3 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and other three specific silicon-containing compounds. |
Author | KIARIE CECILIA W EVANS JESSICA P AUGER ROBERT L FENTON JR JEFFREY L POPA PAUL J SRIVASTAVA YASMIN N RAO YUANQIAO SULLIVAN CHRISTOPHER P JENKINS ROXANNE M WEAVER JOHN D |
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Snippet | PROBLEM TO BE SOLVED: To provide a composition and an antireflective coating for photolithography.SOLUTION: A first composition includes at least: a compound... |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP |
Title | COMPOSITIONS AND ANTIREFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY |
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