COATING LIQUID FOR FORMING COMPOUND OXIDE FILM, AND METHOD FOR PRODUCING COMPOUND OXIDE FILM AND METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR USING THE COATING LIQUID

PROBLEM TO BE SOLVED: To provide: a coating liquid capable of forming a thin film of a compound oxide at a desired position on a substrate in a more simple condition without requiring firing at high temperature; and methods using the coating liquid.SOLUTION: In a method for producing a compound oxid...

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Bibliographic Details
Main Authors SAWADA YOSHIHIRO, MASUJIMA MASAHIRO
Format Patent
LanguageEnglish
Published 10.09.2012
Subjects
BASIC ELECTRIC ELEMENTS
CHEMISTRY
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INORGANIC CHEMISTRY
METALLURGY
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide: a coating liquid capable of forming a thin film of a compound oxide at a desired position on a substrate in a more simple condition without requiring firing at high temperature; and methods using the coating liquid.SOLUTION: In a method for producing a compound oxide film, a coating liquid including an indium (In) chelate compound (I), a zinc (Zn) chelate compound or acetate (Z) and an organic solvent (A) is applied to form a coating on a surface of a base material, and then the coating is fired to be converted to a compound oxide film.
Bibliography:Application Number: JP20110032103