INSPECTION SUPPORT METHOD, INSPECTION METHOD, PHOTOMASK AND INSPECTION SUPPORT SYSTEM

PROBLEM TO BE SOLVED: To provide an inspection support method, an inspection method, a photomask and an inspection support system, enabling easy grasp of the existence of a surplus photoresist after development.SOLUTION: Through a photomask 14 having a transfer pattern 18, formed on a resist 102 lam...

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Bibliographic Details
Main Author YANAGIDA HIDETOSHI
Format Patent
LanguageEnglish
Published 31.05.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide an inspection support method, an inspection method, a photomask and an inspection support system, enabling easy grasp of the existence of a surplus photoresist after development.SOLUTION: Through a photomask 14 having a transfer pattern 18, formed on a resist 102 laminated on a wafer 100, to transfer a circuit pattern with prescribed resolution, and having an inspection pattern, formed on a portion of a region constituting the transfer pattern 18, with higher resolution than the prescribed resolution, a circuit pattern is transferred to the resist 102 by the irradiation of the resist 102 with light of a prescribed wavelength, corresponding to the prescribed resolution, for a prescribed irradiation time. After the circuit pattern is transferred to the resist 102, a wafer 104 having the resist is dipped into a developer in a developer tank 16.
Bibliography:Application Number: JP20100249588