IMMERSION LITHOGRAPHIC APPARATUS, METHOD OF PREVENTING OR REDUCING CONTAMINATION OF THE APPARATUS, AND METHOD OF MANUFACTURING DEVICE

• Main Authors: WANTEN PETER FRANCISCUS, JANSEN HANS, ANTONIUS LEENDERS MARTINUS HENDRIKUS, DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS, VAN DER NET ANTONIUS JOHANNUS, VAN DER DONCK JACQUES COR JOHAN, VAN DEN DOOL TEUNIS CORNELIS, CROMWIJK JAN WILLEM, SCHUH NADJA, WATSO ROBERT DOUGLAS
• Format: Patent
• Language: English
• Published: 06.10.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus.SOLUTION: The immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide...