EXPOSURE DEVICE AND EXPOSURE METHOD

• Main Authors: KARUISHI SHUSAKU, NAGAI SHINICHIRO
• Format: Patent
• Language: English
• Published: 23.06.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TESTING

PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method, with which a mask pattern can be accurately exposed and transferred in relation to the exposed region of a workpiece even if the workpiece is distorted. SOLUTION: The exposure method includes the steps of: detecting an alignment mark of the workpiece 12 and an alignment mark of the mask 21 by an alignment detection system 52; calculating the positional shift amount between the mask 21 and the workpiece 12 and the distortion amount of the workpiece 12 based on the shift amount between both the alignment marks, and adjusting the alignment based on the calculated positional shift amount; and correcting the curvature of a plane mirror 66 for reflecting a light beam of exposure light from a light source 61 based on the calculated distortion amount. The step of correcting the curvature includes steps of: emitting a laser beam L from the exposure surface side by the plane mirror 66 on the optical path EL of the exposure light beam and imaging by a camera 93; and detecting the displacement amounts S1, S2 of the laser beams L, L' imaged when correcting the curvature of the plane mirror 66. Thus, the curvature is corrected corresponding to the distortion mounts α, β. COPYRIGHT: (C)2011,JPO&INPIT