METHOD OF MANUFACTURING PHOTODIODE, AND PHOTODIODE
PROBLEM TO BE SOLVED: To provide the method of manufacturing a photodiode which is a silicon photodiode and has sufficient spectral sensitivity characteristics for a near-infrared wavelength band region, and the photodiode.SOLUTION: An ntype semiconductor substrate 1 which has a first principal surf...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
20.01.2011
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Subjects | |
Online Access | Get full text |
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