METHOD OF MANUFACTURING PHOTODIODE, AND PHOTODIODE

PROBLEM TO BE SOLVED: To provide the method of manufacturing a photodiode which is a silicon photodiode and has sufficient spectral sensitivity characteristics for a near-infrared wavelength band region, and the photodiode.SOLUTION: An ntype semiconductor substrate 1 which has a first principal surf...

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Bibliographic Details
Main Authors SAKAMOTO AKIRA, NAGANO TERUMASA, YAMAMURA KAZUHISA, FUJII YOSHIMARO
Format Patent
LanguageEnglish
Published 20.01.2011
Subjects
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