METHOD FOR MANUFACTURING ZINC OXIDE-BASED SINTERED COMPACT FOR SPUTTERING TARGET

• Main Author: YADA HISATAKA
• Format: Patent
• Language: English
• Published: 24.12.2010
• Subjects: ARTIFICIAL STONE; CEMENTS; CERAMICS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIME, MAGNESIA; METALLURGY; REFRACTORIES; SLAG; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF NATURAL STONE

PROBLEM TO BE SOLVED: To provide a large-sized zinc oxide-based sintered compact having a high density and a low resistance without generating cracking and warpage. SOLUTION: The sintered compact having a high density and a low resistance is obtained by mixing a zinc oxide powder of ≤1 μm in D50 and of ≤1.5 μm in D90, and a gallium oxide powder of ≤1 μm in D50 and of 1 to 10 μm in D90 in a proportion of (90 to 99.9):(0.1 to 10); cold molding the mixture; and heating the obtained molding to 800°C while air or oxygen is being introduced at a proportion of 10 to 200 L/min per 1 m3of a volume inside a sintering furnace, and heating from 800°C to a sintering temperature at 0.3 to 3°C/min, and holding the temperature at the sintering temperature of 1,200 to 1,400°C for 10 to 20 hours, wherein in the case where the area of the principal planar surface is ≥45,000 mm2, the scattering in the sintered compact density when the principal planar surface is divided into each area of 7,500 mm2falls in the range of ±0.04 g/cm3. COPYRIGHT: (C)2011,JPO&INPIT