OBSERVATION APPARATUS

PROBLEM TO BE SOLVED: To provide an observation apparatus capable of observing or measuring an object in a wide range by employing a wavefront aberration adapting technique. SOLUTION: The observation apparatus 1 includes a light source 10, a biaxial scanning system 20, a wavefront modulator 30, an o...

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Bibliographic Details
Main Authors INOUE TAKU, KO KOKIN
Format Patent
LanguageEnglish
Published 27.08.2009
Subjects
COLORIMETRY
DIAGNOSIS
HUMAN NECESSITIES
HYGIENE
IDENTIFICATION
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
MEDICAL OR VETERINARY SCIENCE
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
RADIATION PYROMETRY
SURGERY
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide an observation apparatus capable of observing or measuring an object in a wide range by employing a wavefront aberration adapting technique. SOLUTION: The observation apparatus 1 includes a light source 10, a biaxial scanning system 20, a wavefront modulator 30, an optical branching part 40, an optical detector 50, a wavefront detector 60, a controller 70, etc. The wavefront modulator 30 presents a compensation phase pattern for compensating aberration of input light and also a branching phase pattern for branching the input light to a first and a second light. The wavefront detector 60 receives the input light to detect the wavefront of the light. In a loop processing including detection of wavefront distortion of light by the wavefront detector 60, phase pattern adjustment by the controller 70 based on this detection result, and the presentation of the phase pattern by the wavefront modulator 30, the compensation phase pattern for compensating wavefront aberration is feedback-controlled. COPYRIGHT: (C)2009,JPO&INPIT
Bibliography:Application Number: JP20080033572