EXPOSURE APPARATUS AND CHUCK STAGE FOR THE EXPOSURE APPARATUS

• Main Authors: KOMATSU TAKAYASU, NADAMOTO NOBUNARI, SUZUKI KENSAKU
• Format: Patent
• Language: English
• Published: 20.08.2009
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a chuck stage for an exposure apparatus for improving the manufacturing yield, by effectively preventing a light-exposed manufacture from forming a mottled pattern, a moire pattern, or the like. SOLUTION: The chuck stage 13 includes a bearing surface 20 having a vacu...