EXPOSURE APPARATUS AND CHUCK STAGE FOR THE EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide a chuck stage for an exposure apparatus for improving the manufacturing yield, by effectively preventing a light-exposed manufacture from forming a mottled pattern, a moire pattern, or the like. SOLUTION: The chuck stage 13 includes a bearing surface 20 having a vacu...

Full description

Saved in:
Bibliographic Details
Main Authors KOMATSU TAKAYASU, NADAMOTO NOBUNARI, SUZUKI KENSAKU
Format Patent
LanguageEnglish
Published 20.08.2009
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To provide a chuck stage for an exposure apparatus for improving the manufacturing yield, by effectively preventing a light-exposed manufacture from forming a mottled pattern, a moire pattern, or the like. SOLUTION: The chuck stage 13 includes a bearing surface 20 having a vacuum chucking hole 24 for vacuum-chucking a glass substrate 19 or a holding object. Three wall parts 21, 22, 23 for chucking are formed, on the bearing surface 20, on parts corresponding to outer edges of the glass substrate 19 or the holding object. The wall parts 21, 22, 23 for chucking respectively correspond to three kinds of different size glass substrates, and extend in a wavy shape along outer edges of the respective glass substrates. On the bearing surface 20, a plurality of projecting parts 25 are formed to support the glass substrate 19 or the holding object. Each projecting part 25 has a circular summit part end surface that contacts an undersurface of the glass substrate 19 or the holding object. The projecting parts 25 are disposed in a lattice form on the bearing surface 20. COPYRIGHT: (C)2009,JPO&INPIT
Bibliography:Application Number: JP20090123273