SEMICONDUCTOR DEVICE
PROBLEM TO BE SOLVED: To provide a semiconductor device preventing occurrence of disconnection of upper layer wiring due to stress even if width of wiring is not more than 0.4 μm. SOLUTION: A second interlayer insulating film 5 is laminated on first wiring 4 formed on a prescribed pattern. A second...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
14.05.2009
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Subjects | |
Online Access | Get full text |
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