SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a semiconductor device preventing occurrence of disconnection of upper layer wiring due to stress even if width of wiring is not more than 0.4 μm. SOLUTION: A second interlayer insulating film 5 is laminated on first wiring 4 formed on a prescribed pattern. A second...

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Bibliographic Details
Main Authors NAKAO YUICHI, KAGEYAMA SATOSHI
Format Patent
LanguageEnglish
Published 14.05.2009
Subjects
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