QUANTIFICATION OF HYDROPHOBIC, AND HYDROPHILIC PROPERTIES OF MATERIALS

• Main Authors: URBANOWICZ ADAM MICHAL, BAKLANOV MIKHAIL
• Format: Patent
• Language: English
• Published: 26.03.2009
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

PROBLEM TO BE SOLVED: To provide a non-destructive and simple analytical method which allows in-situ monitoring of plasma damage during the plasma processing, such as, resist stripping. SOLUTION: If a low-dielectric-constant (low-k) film is damaged during plasma processing, one of the reaction produ...