TRANSISTOR, INTEGRATED CIRCUIT, AND INTEGRATED CIRCUIT FORMATION METHOD
PROBLEM TO BE SOLVED: To provide a transistor, an integrated circuit and a method for forming the integrated circuit. SOLUTION: There formed is a configuration having a gate electrode 23 disposed in a gate groove 27 formed on a semiconductor substrate 1 via a gate dielectric 24. The gate electrode 2...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
11.12.2008
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a transistor, an integrated circuit and a method for forming the integrated circuit. SOLUTION: There formed is a configuration having a gate electrode 23 disposed in a gate groove 27 formed on a semiconductor substrate 1 via a gate dielectric 24. The gate electrode 23 includes a conductive carbon material. COPYRIGHT: (C)2009,JPO&INPIT |
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Bibliography: | Application Number: JP20080142718 |