DAMAGE PROCESSING-LIKE PATCH

• Main Author: MATSUBARA HATSUE
• Format: Patent
• Language: English
• Published: 20.11.2008
• Subjects: ACCESSORIES; FINISHING, DRESSING, TENTERING OR STRETCHING TEXTILE FABRICS; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR; HUMAN NECESSITIES; LAUNDERING; LOOMS; METHODS OF WEAVING; OUTERWEAR; PROTECTIVE GARMENTS; TEXTILES; TREATMENT OF TEXTILES OR THE LIKE; WEARING APPAREL; WEAVING; WOVEN FABRICS

PROBLEM TO BE SOLVED: To provide a damage processing-like patch capable of reproducing a perforated damage processing jeans product from which given damage processing disappears because of occurrence of cut of the weft by wearing and washing, and which is spoiled in fashionability as used clothing-like appearance, as a damage processing used clothing-like jeans product given with crush. SOLUTION: This damage processing-like patch is given with damage processing that the warp comes loose, leaving the periphery of a cloth and only the weft is exposed in a reed screen-like state. Furthermore, the damage processing-like patch is such that opposite cloth parts are placed, spacing an interval of the cloth parts, and the weft runs in a reed screen-like state, extending the interval, and also an opening is cut out, leaving the periphery of a cloth, the weft runs so as to close the opening, and both the right and left edges of the weft are each fixed to the cloth parts of both the sides of the opening. COPYRIGHT: (C)2009,JPO&INPIT