METHOD FOR MANUFACTURING COMPOSITION FOR FORMING ORGANIC ANTIREFLECTION LAYER AND METHOD FOR MANUFACTURING PRODUCT HAVING ORGANIC ANTIREFLECTION LAYER

• Main Authors: KUTSUKAKE YUSUKE, TAKADA KEISUKE
• Format: Patent
• Language: English
• Published: 19.06.2008
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMISTRY; COMPOSITIONS BASED THEREON; GENERAL PROCESSES OF COMPOUNDING; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORGANIC MACROMOLECULAR COMPOUNDS; PERFORMING OPERATIONS; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; WORKING-UP

PROBLEM TO BE SOLVED: To provide a method for manufacturing a composition for forming an organic antireflection layer, from which an organic antireflection layer can be formed on a substrate or at least one layer of a basecoat layer formed on the substrate surface while suppressing formation of cracks in the substrate or in the basecoat layer. SOLUTION: The method for manufacturing a composition for forming an organic antireflection layer includes: a step of preparing a mixture for forming an antireflection layer; adjusting the prepared mixture for forming an antireflection layer by diluting and stirring; and ageing the adjusted mixture for forming an antireflection layer after stirring is terminated. The ageing step includes a step of keeping the mixture for forming an antireflection layer after the adjusting step, at a temperature of 20°C to 40°C for 24 to 168 hours. COPYRIGHT: (C)2008,JPO&INPIT