METHOD FOR MANUFACTURING MICROLENS

• Main Authors: OGAWA KOJI, TAKIZAWA KAZUYUKI
• Format: Patent
• Language: English
• Published: 22.05.2008
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PROBLEM TO BE SOLVED: To provide a method for manufacturing a microlens having a projection part higher than the top part of an individual lens. SOLUTION: A substrate is coated with positive type resist, while a gray scale mask 1 as shown in a figure is manufactured. The figure is a plan, and a lens corresponding portion 2 and a projection part corresponding portion 3 are formed on the gray scale mask 1. The light transmittance of the lens corresponding portion 2 is 15-47%, the light transmittance of the projection part corresponding portion 3 is 0%, and the light transmittance of a portion corresponding to a flat portion between the lenses is 47% (coincident with the maximum transmittance of a lens portion). Namely, the top part of the lens is exposed on a condition that the transmittance is 15%, but the projection part is not exposed. When the resist is exposed and developed by using the gray scale mask, the height of the top of the lens formed on the resist is about 5 μm lower than the height of the projection part formed on the resist. Such a GAP is of practical use completely from the aspect of the lens protection. COPYRIGHT: (C)2008,JPO&INPIT