METHOD FOR MANAGING FOREIGN SUBSTANCE OF RETICLE

PROBLEM TO BE SOLVED: To provide a method for detecting generation of a foreign substance on a reticle for manufacturing a semiconductor device. SOLUTION: An inspection portion where a light non-transmitting portion and a light transmitting portion are laid is provided on a pattern face of a reticle...

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Bibliographic Details
Main Author OTE YOSHIHIRO
Format Patent
LanguageEnglish
Published 01.05.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASURING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide a method for detecting generation of a foreign substance on a reticle for manufacturing a semiconductor device. SOLUTION: An inspection portion where a light non-transmitting portion and a light transmitting portion are laid is provided on a pattern face of a reticle substrate. An effective transmittance in a predetermined region including at least a part of the light non-transmitting portion and at least a part of the light transmitting portion is measured. A foreign substance on the reticle is detected based on the effective transmittance. COPYRIGHT: (C)2008,JPO&INPIT
Bibliography:Application Number: JP20060282152