VAPORIZER, FILTERING APPARATUS, FILM FORMING DEVICE AND VAPORIZATION METHOD

• Main Authors: OKURA NARIYUKI, OKABE YASUYUKI
• Format: Patent
• Language: English
• Published: 13.03.2008
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a vaporizer which is capable of performing stable vaporization for a long time by improving re-vaporization efficiency of mist captured in a filter. SOLUTION: A vaporizer comprises a feeding port which is provided in a vaporization chamber forming member, for feeding gases obtained by vaporizing a liquid material to a consumption device; a filter which is provided to cover the feeding port, for capturing a non-vaporized liquid material; and an infrared ray radiation unit, for irradiating the filter with infrared rays. By heating the filter with infrared radiation heat, vaporization efficiency of the non-vaporized liquid material captured by the filter is improved, filter clogging is suppressed, and a service life of the filter is prolonged. COPYRIGHT: (C)2008,JPO&INPIT