X-RAY SPECTROMETER

• Main Authors: MITAMURA SHIGEHIRO, SOEJIMA HIROYOSHI
• Format: Patent
• Language: English
• Published: 29.11.2007
• Subjects: GAMMA RAY OR X-RAY MICROSCOPES; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; IRRADIATION DEVICES; MEASURING; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; PHYSICS; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR; TESTING

PROBLEM TO BE SOLVED: To cope with not only an EPMA but also other X-ray analyzer such as a scanning microscope, by arranging a spectrometer using a curved analyzing crystal of high wavelength resolution distantly from a sample. SOLUTION: A point/point type multicapillary X-ray lens 10 is arranged to conform an incident side focal point F3 thereof with a micro area 3 of the sample 2, and is extended to conform an outgoing side focal point F4 with an incident side focal point F1 of the curved analyzing crystal 4. A characteristic X-ray emitted from the micro area 3 on the sample 2 in response to irradiation with an electron beam 1 is efficiently collected by the X-ray lens 10 to be guided to a position distant from the sample 2, and is emitted to be converged in the focal point F4. Since an X-ray arrives at the curved analyzing crystal 4 while expanded, from the incident side focal point F1, the X-ray efficiently strikes a diffraction face, and the X-ray at a specified wavelength is converged to a focal point F2 to get incident into an X-ray detector 7. COPYRIGHT: (C)2008,JPO&INPIT