ARRANGEMENT FOR GENERATING EXTREME ULTRAVIOLET RADIATION FROM PLASMA GENERATED BY ENERGY BEAM WITH HIGH CONVERSION EFFICIENCY AND MINIMUM CONTAMINATION

• Main Authors: KLOEPFEL DIETHARD, GAEBEL KAI
• Format: Patent
• Language: English
• Published: 01.11.2007
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GAMMA RAY OR X-RAY MICROSCOPES; IRRADIATION DEVICES; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR; X-RAY TECHNIQUE

PROBLEM TO BE SOLVED: To find a novel possibility for generating EUV radiation by means of a plasma (5) induced by an energy beam that permits a more efficient conversion of an energy beam (4) into EUV radiation in a wavelength region near to 13.5 nm, and ensures a long lifetime of optical components and an injection unit (13). SOLUTION: When a mixture of particles (14) with a carrier gas (15) is used, a target feed device (1) has a gas liquefaction chamber (12). At that time, a target material is supplied to the injection unit (13) as a mixture (16) of solid metal particles (14) in a liquefied carrier gas (17), a droplet generator (131) is provided for generating a predetermined droplet size and series (2) of droplets, and means (132; 135, 136, 137, 138; 31, 32) that are controllable in a frequency-dependent manner and which are triggered by a pulse frequency of the energy beam (4) are connected to the injection unit (13) for generating series (23) of droplets. COPYRIGHT: (C)2008,JPO&INPIT