PROTECTION ELEMENT AND MANUFACTURING METHOD THEREOF
PROBLEM TO BE SOLVED: To provide an electrostatic discharge (ESD) protection element with a simple configuration which can be manufactured as a thick-film element on a substrate, can have lower electrostatic capacity, has superior mechanical strength and heat radiation characteristics, has less infl...
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Format | Patent |
Language | English |
Published |
11.10.2007
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Abstract | PROBLEM TO BE SOLVED: To provide an electrostatic discharge (ESD) protection element with a simple configuration which can be manufactured as a thick-film element on a substrate, can have lower electrostatic capacity, has superior mechanical strength and heat radiation characteristics, has less influence due to shock, and can contribute to reduction in thickness and weight, and to provide a manufacturing method therefor. SOLUTION: The element is provided with a pair of electrode patterns 16, 18 whose end surfaces oppose each other with a slight discharge gap 19 on an insulating substrate 14. A functional film 12, containing ZnO as a main component and silicon carbide, is provided in the discharge gap 19. The discharge gap 19 has a width of 10-50 μm; and the functional film 12 is made of a composition containing ZnO as a main constituent, containing a sub-component selected from Mn, Co, Bi and Sb or a rare-earth element, and containing 10 wt.%-40 wt.% silicon carbide with respect to the composition 100 wt.%. COPYRIGHT: (C)2008,JPO&INPIT |
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AbstractList | PROBLEM TO BE SOLVED: To provide an electrostatic discharge (ESD) protection element with a simple configuration which can be manufactured as a thick-film element on a substrate, can have lower electrostatic capacity, has superior mechanical strength and heat radiation characteristics, has less influence due to shock, and can contribute to reduction in thickness and weight, and to provide a manufacturing method therefor. SOLUTION: The element is provided with a pair of electrode patterns 16, 18 whose end surfaces oppose each other with a slight discharge gap 19 on an insulating substrate 14. A functional film 12, containing ZnO as a main component and silicon carbide, is provided in the discharge gap 19. The discharge gap 19 has a width of 10-50 μm; and the functional film 12 is made of a composition containing ZnO as a main constituent, containing a sub-component selected from Mn, Co, Bi and Sb or a rare-earth element, and containing 10 wt.%-40 wt.% silicon carbide with respect to the composition 100 wt.%. COPYRIGHT: (C)2008,JPO&INPIT |
Author | MASUYAMA TOMOHIDE UEDA YOJI MURAMOTO SHOICHI |
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Snippet | PROBLEM TO BE SOLVED: To provide an electrostatic discharge (ESD) protection element with a simple configuration which can be manufactured as a thick-film... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRICITY RESISTORS |
Title | PROTECTION ELEMENT AND MANUFACTURING METHOD THEREOF |
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