EXPOSURE DEVICE, MASK WASHING APPARATUS, MASK WASHING METHOD, AND MASK STORAGE METHOD

PROBLEM TO BE SOLVED: To prevent the lowering of the product yield by facilitating pattern processing with high resolution. SOLUTION: To a mask M which is supported by a mask support pedestal 121 in illumination to the mask M, a gas atomizer 131 atomizes an inert gas g, thereby washing the mask M wi...

Full description

Saved in:
Bibliographic Details
Main Author MITA ISAO
Format Patent
LanguageEnglish
Published 20.09.2007
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To prevent the lowering of the product yield by facilitating pattern processing with high resolution. SOLUTION: To a mask M which is supported by a mask support pedestal 121 in illumination to the mask M, a gas atomizer 131 atomizes an inert gas g, thereby washing the mask M with a mask washer 3. COPYRIGHT: (C)2007,JPO&INPIT
Bibliography:Application Number: JP20060062829