LASER EXPOSURE DEVICE

• Main Authors: YANO TSUTOMU, SHIGETA KAKU, SHIGETA TATSUO
• Format: Patent
• Language: English
• Published: 02.12.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; CORRECTION OF TYPOGRAPHICAL ERRORS; ELECTRIC COMMUNICATION TECHNIQUE; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; LINING MACHINES; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PICTORIAL COMMUNICATION, e.g. TELEVISION; PRINTING; SELECTIVE PRINTING MECHANISMS; STAMPS; TRANSPORTING; TYPEWRITERS

PROBLEM TO BE SOLVED: To provide a laser exposure device that makes it possible to arbitrarily select repetition intervals of a laser spot on the focus surface of a projection optical system, enables extremely accurate irradiation on the laser spot, and can obtain extremely accurate printed matter and a circuit pattern. SOLUTION: The laser exposure device comprises a laser light source, an optical modulation section, a projection optical section, and a pitch variation part which varies and controls array intervals of laser spots. The optical modulation section spatially arrays and divides the laser light of the laser light source with a plurality of control signals, the arrayed output light beams are reduced and projected on the projection optical section, and the pitch variation section varies and controls array intervals of laser spots arrayed at the imaging section of the projection optical section. The laser light source is a semiconductor laser array having multiple emitters and the pitch variation section performs control so that pitch intervals set as array intervals of the laser spots are integral multiples of adjacent laser spot intervals. COPYRIGHT: (C)2006,JPO&NCIPI