CHARGED PARTICLE BEAM APPARATUS

• Main Author: MIYATA TAKAHISA
• Format: Patent
• Language: English
• Published: 15.09.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To obtain an image of high resolution without blur due to the influence of off-axis aberrations, even if the scanning speed is high. SOLUTION: The electrically charged particle beam device is provided with an electronic gun 1, a condensing lens 2 and an objective lens 3 for converging electronic beams from the electronic gun 1 onto a specimen 4, an upper stage deflecting coil 5 and a lower stage deflecting coil 6 for scanning on the specimen 4 by the electronic beams from the electronic gun 1, based on a scanning signal from a scanning signal generator 10, and an indicating means 9 for indicating the image of specimen based on secondary electronics detected by the scanning on the specimen 4. Respective deflecting coils 5, 6 are provided with an upper stage scanning signal generator 21 and a lower stage scanning signal generator 22 to send another scanning signal, whose scanning is earlier by the time interval, coping with the difference between the responding time of the lower stage deflecting coil 6 and that of the upper stage deflecting coil 5, to the lower stage deflecting coil 6 from the lower stage scanning signal generator 22. COPYRIGHT: (C)2005,JPO&NCIPI