SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD

• Main Author: YASUHARA TAKESHI
• Format: Patent
• Language: English
• Published: 02.06.2005
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a semiconductor device and its manufacturing method including a capacitance element (for instance, a MIM capacitance element) having a large margin for a leak current, and capable of easily leveling an interlayer insulating film by decreasing a step of the interlayer...