ALIGNMENT SYSTEM FOR LITHOGRAPHIC APPARATUS USING AT LEAST TWO WAVELENGTHS

• Main Authors: HUBERTUS JOHANNES GERTRUDUS SIMONS, NAVARRO Y KOREN RAMON, JUENINK ANDRE BERNARDUS
• Format: Patent
• Language: English
• Published: 07.10.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; DEVICES USING STIMULATED EMISSION; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

PROBLEM TO BE SOLVED: To provide an alignment system for a lithographic apparatus in which alignment accuracy and/or durability is improved. SOLUTION: The alignment system for the lithographic apparatus comprises a supply source of alignment radiation of a first wavelength and a second wavelength, a...