SURFACE UNEVENNESS FORMATION METHOD, OPTICAL FILM AND DIFFUSION REFLECTING PLATE OBTAINED BY THE METHOD, AND DIFFUSION REFLECTING PLATE PRODUCTION METHOD

• Main Authors: TSURUOKA YASUO, IWAMURO MITSUNORI, KIZAWA KEIKO, TAI SEIJI
• Format: Patent
• Language: English
• Published: 05.02.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a method for easily rendering a resin surface uneven at a low cost, and a transfer original pattern using the method, and to provide a transfer prototype for forming the transfer original pattern, transfer base film, transfer film, diffusion reflecting plate, and an optical film. SOLUTION: The surface unevenness formation method comprises: the step of forming an energy-sensitive, negative type resin composition layer containing (a) at least one or more kinds of polymerizable binder resin, (b) at least one or more kinds of polymerizable monomer or oligomers, and (c) at least one or more kinds of polymerization initiator which forms a free radical by the emission of active energy rays, the compounding composition of (c) the polymerization initiator forming the free radical by the emission of the active energy rays being 0.1 to 10 wt.% of the total of the solid contents of (a) + (b); the step of carrying out the emission of the active energy rays at least one or more times via a mask formed in a pattern; and the step of subjecting to post-heating without an etching operation. COPYRIGHT: (C)2004,JPO