GAS BARRIER FILM EXCELLENT IN RETORT RESISTANCE
PROBLEM TO BE SOLVED: To prepare a gas barrier film having transparency and excellent pressure resistance and heat resistance. SOLUTION: This gas barrier film is obtained by laminating a plastic film (A) and a coating layer (B) formed by using a composition containing an organosilicone compound (b-i...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
29.01.2004
|
Edition | 7 |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | PROBLEM TO BE SOLVED: To prepare a gas barrier film having transparency and excellent pressure resistance and heat resistance. SOLUTION: This gas barrier film is obtained by laminating a plastic film (A) and a coating layer (B) formed by using a composition containing an organosilicone compound (b-i) represented by R1xSi(OR2)yand/or a hydrolyzed condensate (b-ii). When the viscoelasticity of the plastic film (A) is measured at a frequency of 10 Hz in a tensile mode, a ratio (E'50/E'100) of the storage elastic modulus E'50at 50°C to the storage elastic modulus E'100at 100°C is 1.0-4.0 and a ratio (E'50/E'120) of the storage elastic modulus E'50at 50°C to the storage elastic modulus E'120at 120°C is 1.0-6.0. COPYRIGHT: (C)2004,JPO |
---|---|
Bibliography: | Application Number: JP20020184976 |