GAS BARRIER FILM EXCELLENT IN RETORT RESISTANCE

PROBLEM TO BE SOLVED: To prepare a gas barrier film having transparency and excellent pressure resistance and heat resistance. SOLUTION: This gas barrier film is obtained by laminating a plastic film (A) and a coating layer (B) formed by using a composition containing an organosilicone compound (b-i...

Full description

Saved in:
Bibliographic Details
Main Authors YOKOE CHIHO, YAMAMOTO TETSUYA
Format Patent
LanguageEnglish
Published 29.01.2004
Edition7
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PROBLEM TO BE SOLVED: To prepare a gas barrier film having transparency and excellent pressure resistance and heat resistance. SOLUTION: This gas barrier film is obtained by laminating a plastic film (A) and a coating layer (B) formed by using a composition containing an organosilicone compound (b-i) represented by R1xSi(OR2)yand/or a hydrolyzed condensate (b-ii). When the viscoelasticity of the plastic film (A) is measured at a frequency of 10 Hz in a tensile mode, a ratio (E'50/E'100) of the storage elastic modulus E'50at 50°C to the storage elastic modulus E'100at 100°C is 1.0-4.0 and a ratio (E'50/E'120) of the storage elastic modulus E'50at 50°C to the storage elastic modulus E'120at 120°C is 1.0-6.0. COPYRIGHT: (C)2004,JPO
Bibliography:Application Number: JP20020184976