METHOD AND APPARATUS FOR CLEANING SUBSTRATE

• Main Authors: YAMAKOSHI JUNICHI, NAKAMURA TSUGIO
• Format: Patent
• Language: English
• Published: 17.01.2003
• Edition: 7
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; NOZZLES; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PERFORMING OPERATIONS; PHYSICS; PREVENTION OF FOULING IN GENERAL; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; TRANSPORTING

PROBLEM TO BE SOLVED: To surely and efficiently remove particles adhered to the surface of a substrate. SOLUTION: A method for cleaning the substrate comprises steps of mutually isolating a destaticizing chamber 16 and an exhaust chamber 18 from each other, and sequentially conveying the substrates...