PARAMETER ADJUSTING DEVICE FOR PROCESS MODEL, PARAMETER ADJUSTMENT SUPPORTING DEVICE AND ITS METHOD

• Main Authors: NAGAIWA AKIHIRO, KISHIHARA MASAKI, TSUTSUMI MASAHIKO, YAMANAKA OSAMU, MATSUMAE MANABU, HATSUKA YUKIO
• Format: Patent
• Language: English
• Published: 15.11.2002
• Edition: 7
• Subjects: CHEMISTRY; CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATERTREATMENT OR WASTE MANAGEMENT; CONTROL OR REGULATING SYSTEMS IN GENERAL; CONTROLLING; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; METALLURGY; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS; PHYSICS; REGULATING; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

PROBLEM TO BE SOLVED: To allow a process engineer who does not fully understand the internal structure of process, to easily execute parameter adjustment. SOLUTION: A process model parameter adjusting device is provided with a process data collecting means constituted of a process external input collecting means and a process output collecting means, a means for simulating a process model having a parameter set constituted of a plurality of parameters by inputting data supplied through the process data external input collecting means, a means for setting the initial value of the parameter of the process model, a means for analyzing the change of the sensitivity of the parameter, a means for extracting a parameter set whose sensitivity is high based on the analyzed result of the sensitivity, and a means for defining the values of the respective parameters of the parameter set so that an error between the process output simulation value and the process output value can be minimized.