POSITIVE TYPE IMAGING METHOD

• Main Authors: MIZUKAMI JUNJI, TSURUYA YASUYUKI
• Format: Patent
• Language: English
• Published: 09.08.2002
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; LINING MACHINES; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM; PRINTING; PRINTING PLATES OR FOILS; PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES; STAMPS; TRANSPORTING; TYPEWRITERS

PROBLEM TO BE SOLVED: To provide a positive imaging method using a near infrared laser scattering the less quantity of photosensitive layer elements in exposure. SOLUTION: The positive imaging method is to expose an imaging material having a positive type photosensitive composition layer containing (A) a photothermal conversion matter and (B) an alkali soluble resin on the base, and then to develop the material through an alkali developer. It is characterized by exposing with the light exposure (IA) of an upper limit light exposure IC (mJ/cm2) or less expressed as follows: IC = 4.92×10-6(C× )2-6.8×10-2(C× )+4.14×102}× P×(-0.07)+1.5} (1000<=C× <=7000) where : (M-1 cm-1)= molar absorbance coefficient at laser beam absorption wavelength of the photothermal conversion matter C(M) = molarity per unit volume in the photosensitive layer of the photothermal conversion matter P(W) = laser beam intensity.