METHOD FOR FIXING AND HOLDING PATTERN MASK

• Main Authors: TAKAHASHI MASAHARU, YAMADA HIROSHI, MINAFUJI HIROTADA, YAMAMOTO MITSUNORI
• Format: Patent
• Language: English
• Published: 02.08.2002
• Edition: 7
• Subjects: CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; METALLURGY; PRINTED CIRCUITS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a method for fixing and holding a pattern mask which prevents generation of a partial levitation part of the pattern mask and can fix and hold surely the pattern mask to a substrate, using a simple constitution. SOLUTION: Magnets 12 are arranged to be perpendicular to the longitudinal direction of penetrating holes as a plurality of parallel patterns formed in the pattern mask 1, and intersect all the penetration holes. A magnetic attractive means 14 including the magnets 12 is made to abut against the pattern mask 1 via a substrate 5, thereby making magnetic flux generated in the magnetic attraction means 14 concentrate and flow in the longitudinal direction of the penetrating holes of the pattern mask 1.