FILM DEPOSITION APPARATUS USING CATHODE ARC DISCHARGE
PROBLEM TO BE SOLVED: To provide a film deposition apparatus which can deposite a thin film having small internal stress as the film deposition apparatus in which thin films can be deposited using cathode arc discharge. SOLUTION: When irradiating a substrate 41 with a plasma beam PB generated from a...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
31.07.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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