DEFECT-INSPECTION APPARATUS AND DEFECT INSPECTION METHOD

• Main Authors: TASHIRO SHINTARO, IKEDA TOKUYUKI, KADOSAWA FUMIO
• Format: Patent
• Language: English
• Published: 07.12.2001
• Edition: 7
• Subjects: CALCULATING; COMPUTING; COUNTING; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; TESTING

PROBLEM TO BE SOLVED: To provide a defect-inspection apparatus and a defect inspection method whereby the apparatus can be made compact and inspection can be sped up. SOLUTION: To this defect-inspection apparatus are set a line sensor 4 with sensor elements arranged for detecting a concentration lev...