DEFECT-INSPECTION APPARATUS AND DEFECT INSPECTION METHOD

PROBLEM TO BE SOLVED: To provide a defect-inspection apparatus and a defect inspection method whereby the apparatus can be made compact and inspection can be sped up. SOLUTION: To this defect-inspection apparatus are set a line sensor 4 with sensor elements arranged for detecting a concentration lev...

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Bibliographic Details
Main Authors TASHIRO SHINTARO, IKEDA TOKUYUKI, KADOSAWA FUMIO
Format Patent
LanguageEnglish
Published 07.12.2001
Edition7
Subjects
CALCULATING
COMPUTING
COUNTING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide a defect-inspection apparatus and a defect inspection method whereby the apparatus can be made compact and inspection can be sped up. SOLUTION: To this defect-inspection apparatus are set a line sensor 4 with sensor elements arranged for detecting a concentration level of an object 1 to be inspected, a moving device for moving the line sensor or the object in a direction intersecting a direction in which the sensor elements of the line sensor are arranged, a threshold storage device 8 for storing one threshold value for each pixel, a binarization circuit 6 for binarizing the concentration level with the use of threshold values, a run length device 7 for holding the concentration level only when binary data have a predetermined value and generating one-dimensional defect information from the held concentration level, and a link process device 9 for linking each of the one-dimensional defect information and generating two-dimensional defect information.
Bibliography:Application Number: JP20000160895