POLIMERI E LASTRE FOTOSENSIBILI

A compound of formula (I), wherein R, Y, Y', X, X', R' and R'' have the meanings shown in the description; process for preparing the compound of formula (I) and presensitized positive or negative offset printing plates having a photosensitive layer comprising a compound of f...

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Bibliographic Details
Main Authors DE CANDIDO STEFANO, CANESTRI GIUSEPPE
Format Patent
LanguageItalian
Published 14.06.1992
Edition5
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Abstract A compound of formula (I), wherein R, Y, Y', X, X', R' and R'' have the meanings shown in the description; process for preparing the compound of formula (I) and presensitized positive or negative offset printing plates having a photosensitive layer comprising a compound of formula (I).
AbstractList A compound of formula (I), wherein R, Y, Y', X, X', R' and R'' have the meanings shown in the description; process for preparing the compound of formula (I) and presensitized positive or negative offset printing plates having a photosensitive layer comprising a compound of formula (I).
Author DE CANDIDO STEFANO
CANESTRI GIUSEPPE
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Snippet A compound of formula (I), wherein R, Y, Y', X, X', R' and R'' have the meanings shown in the description; process for preparing the compound of formula (I)...
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
Title POLIMERI E LASTRE FOTOSENSIBILI
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