ADHESIVES FOR CHEMICAL MECHANICAL PLANARIZATION APPLICATIONS

Adhesives for use in polishing pads in chemical mechanical planarization (CMP) applications are described. The adhesives include an adhesive component and exhibit particular properties. Also described are transfer tapes containing the adhesives, CMP pads utilizing the adhesives, and related methods...

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Main Authors HSEIH, Dong-Tsai, BOGNER, Josh M
Format Patent
LanguageChinese
English
Published 06.06.2019
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Abstract Adhesives for use in polishing pads in chemical mechanical planarization (CMP) applications are described. The adhesives include an adhesive component and exhibit particular properties. Also described are transfer tapes containing the adhesives, CMP pads utilizing the adhesives, and related methods of use.
AbstractList Adhesives for use in polishing pads in chemical mechanical planarization (CMP) applications are described. The adhesives include an adhesive component and exhibit particular properties. Also described are transfer tapes containing the adhesives, CMP pads utilizing the adhesives, and related methods of use.
Author BOGNER, Josh M
HSEIH, Dong-Tsai
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DocumentTitleAlternate 用於化學機械平坦化應用的粘合劑
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Snippet Adhesives for use in polishing pads in chemical mechanical planarization (CMP) applications are described. The adhesives include an adhesive component and...
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SourceType Open Access Repository
SubjectTerms ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE
ADHESIVES
CHEMISTRY
DYES
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL
PAINTS
POLISHES
USE OF MATERIALS AS ADHESIVES
Title ADHESIVES FOR CHEMICAL MECHANICAL PLANARIZATION APPLICATIONS
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