METHOD AND DEVICE FOR THERMALLY TREATING SUBSTRATES
This invention relates to a method and a device for the thermal treatment of substrates in which the substrates are held in contact with or a small distance away from a heating plate, which is heated by a plurality of separately controllable heating elements on the side of the heating plate facing a...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
17.08.2007
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Subjects | |
Online Access | Get full text |
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Summary: | This invention relates to a method and a device for the thermal treatment of substrates in which the substrates are held in contact with or a small distance away from a heating plate, which is heated by a plurality of separately controllable heating elements on the side of the heating plate facing away from the substrate, the heating plate being surrounded, at least in its plane, by a frame spaced apart therefrom, and gas being conveyed, in a controlled manner, through a gap between the frame and at least one edge of the heating plate. |
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Bibliography: | Application Number: HK20070106695 |