DISPOSITIF DE TRAITEMENT DE PIECES

The invention relates to a device (50) for treating semiconductor substrates (60), the device comprising an enclosure (52) and at least one circuit (68, 70) for feeding a gaseous mixture into the enclosure, the enclosure containing at least one support (54), the support comprising a stack of plates...

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Bibliographic Details
Main Authors TRAN, STEPHANIE, LAZZARELLI, GUY, SEMMACHE, BACHIR
Format Patent
LanguageFrench
Published 16.11.2018
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The invention relates to a device (50) for treating semiconductor substrates (60), the device comprising an enclosure (52) and at least one circuit (68, 70) for feeding a gaseous mixture into the enclosure, the enclosure containing at least one support (54), the support comprising a stack of plates (58) on which the semiconductor substrates are supported, each plate having a substantially horizontal face on which at least one of the semiconductor substrates is supported, wherein at least one of the plates comprises at least one passage for the gaseous mixture between the substrate and the plate.
Bibliography:Application Number: FR20160058054