MASQUE DE LITHOGRAPHIE A RAYONS X ET PROCEDE DE FABRICATION DE CELUI-CI
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| Main Author | |
|---|---|
| Format | Patent |
| Language | French |
| Published |
02.05.1986
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| Edition | 4 |
| Subjects | |
| Online Access | Get full text |
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| Author | HIDEO YOSHIHARA, AKIRA OZAWA, MISAO SEKIMOTO ET TOSHIRO ONO |
|---|---|
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| Notes | Application Number: FR19830011817 |
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| PublicationDate | 19860502 |
| PublicationDateYYYYMMDD | 1986-05-02 |
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| PublicationDecade | 1980 |
| PublicationYear | 1986 |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS |
| Title | MASQUE DE LITHOGRAPHIE A RAYONS X ET PROCEDE DE FABRICATION DE CELUI-CI |
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