CONTROLLING ABERRATION IN AN OPTICAL SYSTEM, A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
A method includes determining optical aberrations of an optical system, identifying an illumination profile that compensates for the optical aberrations of the optical system, and curing a layer of optical cement of an optical device using a modulated energy beam to achieve the identified illuminati...
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
28.02.2024
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Subjects | |
Online Access | Get full text |
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Abstract | A method includes determining optical aberrations of an optical system, identifying an illumination profile that compensates for the optical aberrations of the optical system, and curing a layer of optical cement of an optical device using a modulated energy beam to achieve the identified illumination profile. |
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AbstractList | A method includes determining optical aberrations of an optical system, identifying an illumination profile that compensates for the optical aberrations of the optical system, and curing a layer of optical cement of an optical device using a modulated energy beam to achieve the identified illumination profile. |
Author | SHOME, Krishanu COSTON, Scott, Douglas DU, Kan |
Author_xml | – fullname: SHOME, Krishanu – fullname: COSTON, Scott, Douglas – fullname: DU, Kan |
BookMark | eNqNzL0KwjAUhuEMOvh3D-cCFKwtOh_TtAmkOSGJQ6dSJE6lLdT7xxbE2emDl4dvy1b90McN6ziZ4EhrZUrAu3AOgyIDygAaIBsURw2-9kFUR0CoxKKprH9NqyCpdGil4oDW4vzw8LM1-aIl5R6CFE5QsWfrV9tN8fDdHYNCBC5PcRyaOI3tM_bx3QibpZdbcj1jkv5BPv1IOB8 |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
DocumentTitleAlternate | COMMANDE D'ABERRATION DANS UN SYSTÈME OPTIQUE, SYSTÈME DE MÉTROLOGIE, APPAREIL LITHOGRAPHIQUE ET PROCÉDÉS ASSOCIÉS STEUERUNG DER ABERRATION IN EINEM OPTISCHEN SYSTEM, METROLOGIESYSTEM, LITHOGRAFISCHE VORRICHTUNG UND VERFAHREN DAFÜR |
ExternalDocumentID | EP4327160A1 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_EP4327160A13 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 12:49:19 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English French German |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_EP4327160A13 |
Notes | Application Number: EP20220718989 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240228&DB=EPODOC&CC=EP&NR=4327160A1 |
ParticipantIDs | epo_espacenet_EP4327160A1 |
PublicationCentury | 2000 |
PublicationDate | 20240228 |
PublicationDateYYYYMMDD | 2024-02-28 |
PublicationDate_xml | – month: 02 year: 2024 text: 20240228 day: 28 |
PublicationDecade | 2020 |
PublicationYear | 2024 |
RelatedCompanies | ASML Netherlands B.V |
RelatedCompanies_xml | – name: ASML Netherlands B.V |
Score | 3.5216432 |
Snippet | A method includes determining optical aberrations of an optical system, identifying an illumination profile that compensates for the optical aberrations of the... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
Title | CONTROLLING ABERRATION IN AN OPTICAL SYSTEM, A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240228&DB=EPODOC&locale=&CC=EP&NR=4327160A1 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR3LSsNAcKnF102rYn2xB8nJoN3dJrkUSZNNU7HZkKTSnko2DyhIWmzE33eSPvSit2V2GJiBee_MInRPUq2jGTlVk64uVZYxosZGnqkk65I0p5KxuN726WnumL1MupMGmm9nYeo9oV_1ckTQqAT0vazt9fKniGXXbytXj3IOoMWzE_VsZZMdV60CYih2v8d9YQtLsSw4KV7QY5RAZvBkQqK0B1F3FTe99auRlOVvf-KcoH0fSBXlKWpkRQsdWdtv11rocLTpdrfQQf08M1kBcKOCqzP0bgkvCgTk4N4Am30erKtMeOhh08PCj6oFBzichhEfPWATj3iFLQbTHex1GLliEJi-O7Sw6fsmUBiHgOvZFbYr7BBHLg-4cM4RdnhkuSowMNuJasb9HaP0AjWLRZFdIkx1yZKYpik1dJZpMdg0ImMqZaJ3kiQnbdT-k8zVP3fX6LiS-XrC-wY1y4_P7BZ8dCnvavl-A3OVjn8 |
link.rule.ids | 230,309,786,891 |
linkProvider | European Patent Office |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=CONTROLLING+ABERRATION+IN+AN+OPTICAL+SYSTEM%2C+A+METROLOGY+SYSTEM%2C+LITHOGRAPHIC+APPARATUS%2C+AND+METHODS+THEREOF&rft.inventor=SHOME%2C+Krishanu&rft.inventor=COSTON%2C+Scott%2C+Douglas&rft.inventor=DU%2C+Kan&rft.date=2024-02-28&rft.externalDBID=A1&rft.externalDocID=EP4327160A1 |