METROLOGY METHOD AND DEVICE

Disclosed is a metrology method and associated devices. The method comprises obtaining a first image, said first image being subject to one or more non-isoplanatic aberrations of an optical system used to capture said image; and non-iteratively correcting said first image for the effect of said one...

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Bibliographic Details
Main Authors KONIJNENBERG, Alexander Prasetya, COENE, Willem Marie Julia Marcel, KOOLEN, Armand Eugene Albert, DEN BOEF, Arie Jeffrey, TUKKER, Teunis Willem
Format Patent
LanguageEnglish
French
German
Published 24.05.2023
Subjects
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