METROLOGY METHOD AND DEVICE
Disclosed is a metrology method and associated devices. The method comprises obtaining a first image, said first image being subject to one or more non-isoplanatic aberrations of an optical system used to capture said image; and non-iteratively correcting said first image for the effect of said one...
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Main Authors | , , , , |
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Format | Patent |
Language | English French German |
Published |
24.05.2023
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Subjects | |
Online Access | Get full text |
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