HIGH SPEED SYNCHRONIZATION OF PLASMA SOURCE/BIAS POWER DELIVERY

A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal i...

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Bibliographic Details
Main Authors BURRY, Aaron M, KOZAKEVICH, Felix Leib, GITLIN, Benjamin J, HOLLAND, John, OLDZIEJ, Mariusz, JI, Bing, BHOWMICK, Ranadeep, SMYKA, Jonathan W, MARAKHTANOV, Alexei, RADOMSKI, Aaron T, FISK, Larry J
Format Patent
LanguageEnglish
French
German
Published 04.05.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.
Bibliography:Application Number: EP20200831723